Emerging lithographic technologies XII (26-28 February 2008, San Jose, California, USA)Schellenberg, F. M.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7106-2, 2 v, isbn 978-0-8194-7106-2Conference Proceedings

Study of the simulation parameter for EUVLSEKIGUCHI, Atushi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731G.1-72731G.11, 2Conference Paper

Design for manufacturability through design-process integration II (28-29 February 2008, San Jose, California, USA)Singh, Vivek K; Rieger, Michael L.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7110-9, 1 v. (various pagings), isbn 978-0-8194-7110-9Conference Proceedings

Advanced process control of Poly Silicon Gate Critical DimensionsRUDOLPH, P.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61550B.1-61550B.6, issn 0277-786X, isbn 0-8194-6198-9, 1VolConference Paper

Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

Metrology, inspection, and process control for microlithography XXIII (23-26 February 2009, San Jose, California, United States)Allgair, John Alexander; Raymond, Christopher J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 2 vol, 2, isbn 978-0-8194-7525-1 0-8194-7525-4Conference Proceedings

Metrology, inspection, and process control for microlithography XXII (25-28 February 2008, San Jose, California, USA)Allgair, John Alexander; Raymond, Christopher J.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7107-9, 2 v, isbn 978-0-8194-7107-9Conference Proceedings

Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)Flagello, Donis G.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6639-6, 3 v, isbn 978-0-8194-6639-6Conference Proceedings

Data analysis and modeling for process control III (23 February 2006, San Jose, California, USA)Emami, Iraj; Tobin, Kenneth W.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6198-9, 1Vol, pagination multiple, isbn 0-8194-6198-9Conference Proceedings

Pressure control for reduced microbubble formationBRAGGIN, Jennifer.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730U.1-72730U.9, 2Conference Paper

Stochastic Modeling in Lithography: The Use of Dynamical Scaling in Photoresist DevelopmentMACK, Chris A.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732I.1-72732I.15, 2Conference Paper

Double Patterning Study with Inverse LithographyKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692323.1-692323.6, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's lawITO, Hiroshi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7108-6, Part I, 692302.1-692302.15Conference Paper

Predictive modeling for the management of consumable optics in a lithographic systemCONLEY, Christopher.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61550N.1-61550N.9, issn 0277-786X, isbn 0-8194-6198-9, 1VolConference Paper

Characteristic three-dimensional structure of resist's distribution after drying a resist solution coated on a flat substrate: analysis using the extended dynamical model of the drying processKAGAMI, Hiroyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727335.1-727335.8, 2Conference Paper

Molecular resists based on calix[4]resorcinarene derivatives for EB lithographyOKUYAMA, Kenichi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 7273U.1-72732U.7, 2Conference Paper

Theoretical analysis of development behavior of resist measured by QCMTORIUMI, Minoru.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732Y.1-72732Y.6, 2Conference Paper

Alternative lithographic technologies (24-26 February 2009, San Jose, California, United States)Schellenberg, F. M; La Fontaine, Bruno M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7271, issn 0277-786X, isbn 978-0-8194-7524-4 0-8194-7524-6, 2 vol, 2, isbn 978-0-8194-7524-4 0-8194-7524-6Conference Proceedings

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughnessMORITA, Hiroshi; DOI, Masao.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727337.1-727337.8, 2Conference Paper

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

At-wavelength reflectometry with a microfocus EUV tubeEGBERT, André; BECKER, Stefan.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69213W.1-69213W.6, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

EUV pattern shift compensation strategiesSCHMOELLER, T; KLIMPEL, T.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69211B.1-69211B.8, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

Analytical Approach to High-NA ImagesKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65203D.1-65203D.6, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

Impact of Mask Error on OPC for 45nm NodePARK, Oseo.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65203Q.1-65203Q.10, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

Methods for comparative extraction of OPC responseZAVECZ, Terrence E.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65201T.1-65201T.12, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper